tantalum boride造句
造句与例句手机版
- Tantalum boride films can be deposited from a gas mixture of TaCl 5-BCl 3-H 2-Ar in the temperature range 540 800 癈 . TaB 2 ( single-phase ) is deposited at a source gas flow ratio ( BCl 3 / TaCl 5 ) of six and a temperature above 600 癈 . TaB ( single-phase ) is deposited at BCl 3 / TaCl 5 = 2 4 and T = 600 700 癈.
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